Olympus BX53M, Olympus BX53,

Olympus BX53M, Olympus BX53,

Olympus BX53M, Olympus BX53,

Olympus BX53M, Olympus BX53,

Olympus BX53M, Olympus BX53,
Olympus BX53M, Olympus BX53,

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Kính hiển vi BX53 BX53M

BX53M Reflected and Reflected/Transmitted Light Combination

There are two types of microscope frames in the BX53M BX53 series, one for reflected light only and one for both reflected and transmitted light. Both frames can be configured with manual, coded, or motorized components. The frames are outfitted with ESD capability to protect electronic samples.

BX53M IR Combination

IR objectives can be used for semiconductor inspection, measurement, and processing applications where imaging through silicon is required to see the pattern. 5X to 100X infrared (IR) objectives are available with chromatic aberration correction from visible light wavelengths through the near infrared. For high magnification work, rotating the correction collar of the LCPLNIR series of lenses corrects for aberrations caused by sample thickness. A clear image is obtained with a single objective.

BX53M Polarized Light Combination

The optics of the BX53M polarized light combination provide geologists with the right tools for high-contrast polarized light imaging. Applications such as mineral identification, investigating the optical characteristics of crystals, and observing solid rock sections benefit from system stability and precise optical alignment.

BXFM System

The BXFM can be adapted to special applications or integrated into other instruments. The modular construction provides for straightforward adaptation to unique environments and configurations with a variety of special small illuminators and fixturing mounts.

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