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LEXT OLS5100

Built for failure analysis and material engineering research, the OLS5100 laser microscope combines exceptional measurement accuracy and optical performance with smart tools that make the microscope easy to use. Precisely measure shape and surface roughness at the submicron level quickly and efficiently to simplify your workflow with data you can trust.

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LEXT™ OLS5100 3D Laser Scanning Microscope

Laser Microscope for Material Analysis

Smart Workflow, Faster Experiments

Guaranteed Measurement Accuracy

LEXT microscope objectives deliver highly accurate measurement data. Paired with the Smart Lens Advisor, you can acquire accurate data to be confident about.

Guaranteed measurement accuracy
10x to 100x objectives that reduce aberrations at 405 nm to capture the correct shape of your sample throughout the entire field of view
Smart Lens Advisor helps you choose the right objective lens for your roughness measurement

Series of lenses

Conventional lenses have difficulty making accurate measurements in peripheral areas

Conventional lenses have difficulty making accurate measurements in peripheral areas.

Dedicated LEXT objectives accurately measure peripheral areas

Dedicated LEXT objectives accurately measure peripheral areas.

Easy Laser Scanning Microscopy

Using the microscope is easy for novice and experienced users thanks to thoughtfully designed software.

Acquire accurate data easily—put your sample on the stage and press the start button.
Measurement performance guarantee tailored to your operating environment*.

The information, including guaranteed accuracy, on this web page is based on conditions set by Evident

Easier Material Engineering and Failure Analysis Experiments

The Smart Experiment Manager simplifies your submicron 3D observation and failure analysis experiment workflows by automating previously time-consuming tasks.

Automate your analysis workflow with macro functions
Measurement data is easy to organize
Auto-populate data to your experiment plan matrix, reducing the chance of input errors
Measurement results are displayed in a list, enabling a pass/fail judgment at a glance.

Main unit

Model		OLS5100-SAF	OLS5100-SMF	OLS5100-LAF	OLS5100-EAF
Total magnification		54x–17,280x
Field of view		16 µm–5,120 µm
Measurement principle	Optical system	Reflection-type confocal laser scanning laser microscope Reflection-type confocal laser scanning laser-DIC microscope Color Color-DIC
	Light receiving element	Laser: Photomultiplier (2 channels) Color: CMOS color camera
Height measurement	Display resolution	0.5 nm
	Dynamic range	16 bits
	Repeatability σ_n-1^{1 2 *5}	5X：0.45 μm, 10X：0.1 μm, 20X : 0.03 μm, 50X : 0.012 μm, 100X : 0.012 μm
	Accuracy ^{1 3 *5}	0.15+L/100 μm (L:Measuring length[μm])
	Accuracy for stitched image ^{1 3 *5}	10X：5.0+L/100 μm, 20X or higher : 1.0+L/100 μm (L: Stitching length [μm])
	Measurement noise (Sq noise) ^{1 4 *5}	1 nm (Type)
Width measurement	Display resolution	1 nm
	Repeatability 3σ_n-1 ^{1 2 *5}	5X: 0.45 µm, 10X: 0.1 µm, 20X: 0.03 µm, 50X: 0.012 µm, 100X: 0.012 µm
	Accuracy ^{1 3 *5}	Measurement value +/- 1.5%
	Accuracy for stitched image ^{1 3 *5}	10X : 24+0.5L μm, 20X : 15+0.5L μm, 50X : 9+0.5L μm, 100X : 7+0.5L μm (L: Stitching length [mm])
Maximum number of measuring points in a single measurement		4096 × 4096 pixels
Maximum number of measuring points		36-megapixels
XY stage configuration	Length measurement module	•	NA	NA	•
	Operating range	100 × 100 mm (3.9 × 3.9 in.) Motorized	100 × 100 mm (3.9 × 3.9 in.) Manual	300 × 300 mm (11.8 × 11.8 in.) Motorized	100 × 100 mm (3.9 × 3.9 in.) Motorized
Maximum sample height		100 × 100 mm (3.9 × 3.9 in.)	30 mm (1.2 in.)	30 mm (1.2 in.)	210 mm (8.3 in.)
Laser light source	Wavelength	405 nm
	Maximum output	0.95 mW
	Laser class	Class 2 (IEC60825-1:2007, IEC60825-1:2014)
Color light source		White LED
Electrical power		240 W	240 W	278 W	240 W
Mass	Microscope body	Approx. 31 kg (68.3 lb)	Approx. 32 kg (70.5 lb)	Approx. 50 kg (110.2 lb)	Approx. 43 kg (94.8 lb)
	Control box	Approx. 12 kg (26.5 lb)

*1 Guaranteed when used in constant temperature and constant-temperature environment (temperature: 20˚C±1˚C, humidity: 50%±10%) specified in ISO554(1976), JIS Z-8703(1983).
*2 For 20x or higher, when measured with MPLAPON LEXT series objectives.
*3 When measured with dedicated LEXT objective.
*4 Typical value when measured with MPLAPON100XLEXT objective, and may differ from the guaranteed value.
*5 Guaranteed under Olympus Certificate System.

** The OS license of Window 10 has been certified for the microscope controller provided by olympus. Therefore, Microsoft's license terms are applied and you agree to the terms.Please refer to the following for Microsoft license terms.
https://www.microsoft.com/en-us/Useterms/Retail/Windows/10/UseTerms_Retail_Windows_10_english.htm

Objectives

Series	Model	Numerical Aperture (NA)	Working Distance (WD) (mm)
UIS2 objective lens	MPLFLN2.5x	0.08	10.7
UIS2 objective lens	MPLFLN5x	0.15	20
Dedicated LEXT objective lens (10X)	MPLFLN10xLEXT	0.3	10.4
Dedicated LEXT objective lens (high-performance type)	MPLAPON20xLEXT	0.6	1
	MPLAPON50xLEXT	0.95	0.35
	MPLAPON100xLEXT	0.95	0.35
Dedicated LEXT objective lens (l