LEXT OLS5100 Laser Microscope

LEXT OLS5100 Laser Microscope

LEXT OLS5100 Laser Microscope

LEXT OLS5100 Laser Microscope

LEXT OLS5100 Laser Microscope
LEXT OLS5100 Laser Microscope

Product detail

LEXT OLS5100 Laser Microscope
Tìm hiểu về LEXT OLS5100 Laser Microscope, công nghệ quét laser tiên tiến, độ chính xác cao và ứng dụng rộng rãi trong kiểm tra vật liệu và nghiên cứu sản phẩm mới. Khám phá lợi ích khi sử dụng OLS5100.
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Laser Microscope for Material Analysis

Smart Workflow, Faster Experiments

Built for failure analysis and material engineering research, the OLS5100 laser microscope combines exceptional measurement accuracy and optical performance with innovative tools that make the microscope easy to use. Precisely measure shape and surface roughness at the submicron level quickly and efficiently to simplify your workflow with data you can trust.

Guaranteed Measurement Accuracy

LEXT microscope objectives deliver highly accurate measurement data. Paired with the Smart Lens Advisor, you can acquire accurate data that you can be confident in.

  • Guaranteed measurement accuracy

  • 10x to 100x objectives that reduce aberrations at 405 nm to capture the correct shape of your sample throughout the entire field of view

  • Smart Lens Advisor helps you choose the right objective lens for your roughness measurement

Series of lenses

Conventional lenses have difficulty making accurate measurements in peripheral areas

Conventional lenses have difficulty making accurate measurements in peripheral areas.

Dedicated LEXT objectives accurately measure peripheral areas

Easy Laser Scanning Microscopy

The thoughtfully designed software makes using the microscope easy for novice and experienced users

..

  • Acquire accurate data easily—put your sample on the stage and press the start button

  • Measurement performance guarantee tailored to your operating environment*.

The information, including guaranteed accuracy, on this web page is based on conditions set by Evident.

Easier Material Engineering and Failure Analysis Experiments

 

The Smart Experiment Manager

 

 

 

 

 

simplifies your submicron 3D observation and failure analysis experiment workflows 

by automating previously time-consuming tasks.

  • Automate your analysis workflow with macro functions

  • Measurement data is easy to organise

  • Autopopulates data to your experiment plan matrix, reducing the chance of input errors

  • Measurement results are displayed in a list, enabling a pass/fail judgment at a glance.

 

Fully Customizable to Your Specifications

Implement all the advanced features of the OLS5100 laser scanning microscope for material analysis of large and heavy samples.

Learn More

 

 

 

Customized Solutions

Service and Support You Can Trust

From calibration to training, we offer a broad portfolio of services to help you maintain optimal device performance. Evident service contracts are:

  • Straightforward—so you can focus on the core of your business

  • Efficient—we can schedule preventative maintenance, including calibrations, on your behalf

  • Cost-effective—providing you savings throughout the life of the contract

 

 

 

Benefits

Laser Microscope Benefits

1. Sub-micron 3D observation/measurement

Observe steps in the nanometer range and measure height differences at the sub-micron level

Observe steps in the nanometer range and measure height differences at the sub-micron level.

2. ISO25178-compliant surface roughness measurement

measure surface roughness from linear to planar

Measure surface roughness from linear to planar

3. Non-contact, nondestructive, and fast

No sample preparation required—simply place the sample on the stage and you're ready to measure

No sample preparation is required. Place the sample on the stage, and you'll be ready to measure.

Reliable Data at the Push of a Button

Smart Scan II

The Smart Scan II feature lets experienced and novice users acquire data quickly and easily. Place the sample on the stage, press the start button, and the microscope does the rest.

  • PEAK algorithm: The OLS5100 microscope incorporates a PEAK algorithm for 3D data construction. This algorithm provides highly accurate data from low to high magnifications and reduces the data acquisition time.

  • Skip unnecessary scans: When measuring the shape of steps on a sample containing near-vertical planes, such as an electronic component or MEMS, the data acquisition time can be reduced by skipping the unnecessary scanning range in the Z-direction. A 100 μm step can be measured in about 10 seconds without degrading the accuracy (when using a MPLAPON50XLEXT objective).

  • Accurate shape data: The OLS5100 microscope’s automatic judgment system adjusts to the requirements of each sample, while the HDR scan acquires two sets of shape information by varying the detection sensitivity to build accurate shape data.

reliable data at the push of a button

Measurement performance guarantee tailored to your operating environment

Accuracy and repeatability guaranteed

Accuracy and repeatability guaranteed

 

 


The performance of a measuring tool is typically expressed using accuracy, which indicates how close a measurement value is to its true value, and repeatability, which indicates the degree of variation in repeated measurement values. We guarantee the accuracy and repeatability of the microscope based on a traceable system so that you can be confident in your measurement results.

Surface metrology beyond the field of view

 

Surface metrology beyond the field of view

 

 


The OLS5100 microscope incorporates a length-measuring module in the motorized stage, and we guarantee the accuracy of the stitched image data. While previous laser microscopes stitched data based on pattern matching, the OLS5100 microscope adds the position information from the length measuring module to the pattern matching to provide highly reliable stitched data with guaranteed accuracy.

*Only for OLS5100-SAF/EAF

 

User-Friendly High-Resolution/High-Magnification Observation

Continuous auto focus

The microscope’s continuous autofocus keeps your images in focus when moving the stage or changing objectives, minimizing the need for manual adjustments. Permanent focus tracking enables you to perform observations quickly and easily.

continuous auto focus continuous auto focus

Dual DIC for nano-scale, real-time observation

Detect minute damage in your sample with real-time, nanometerscale observation. Differential interference contrast (DIC) observation enables you to visualize nanometer-scale surface contours that are normally beyond the resolving power of a laser microscope. With DIC laser mode, the OLS5100 microscope can obtain live images comparable to those of an electron microscope, even when using a 5x or 10x low-power objective.

Back surface of wafer

Back surface of wafer

Hard disk landing zone

Hard disk landing zone

Comprehensive Analysis

Many analysis functions are available. The following is just an example, so please download the brochure or contact your Evident representative for details.

ISO25178 compliant areal roughness measurement

 

 

The OLS5100 microscope scans the sample surface with a 0.4 μm diameter laser beam, enabling it to easily measure the surface roughness of samples that cannot be measured with contact surface roughness gauges. The ability to simultaneously acquire the color image, laser image, and 3D shape data of a surface that can't be measured with a contact surface roughness gauge expands the scope of analysis.

ISO25178 compliant areal roughness measurement

Profile measurement/ Measurement assist tool

The profile measurement function displays the surface profile by arbitrarily drawing a measurement line on the position to be measured on an image. It also measures the step between any two arbitrary points, width, cross-sectional area, and radius. Unlike contact-based measuring tools, setting the measured positions is easy. The measurement lines and points can be checked on the image, so even a very small site can be measured accurately. With the Measurement assist tool, the point to be measured can be correctly specified using the highest, lowest, middle, and/or mean points. When a site is specified in the acquired data, the feature points are automatically extracted according to specified conditions.

Measurement of the step between the highest and lowest points in a surface profile

Measurement of the step between the highest and lowest points in a surface profile

 

Software

Simple Material Engineering and Failure Analysis Experiment Management

Managing experiment conditions when testing new materials is complicated, so the OLS5100 laser microscope’s Smart Experiment Manager simplifies the process by automating key steps, such as creating the experiment plan.

forensic engineering software

Automate Routine Workflows

Macro function

You can automate the entire inspection workflow using the macro production tool. Easily create and edit procedures, and then run the registered macro file to obtain reliable results. Combined with the Smart Experiment Manager, you can make pass/fail judgments with a single click.

Automate Routine Workflows

Automate Routine Workflows

Streamline Data Organization

Quick data sorting

 

 


Even if experimental conditions have not been determined in advance, conditions can be determined while acquiring data. Conditions can be changed during the experiment, and images and analysis data can be easily added by drag-and-drop. It supports flexible experiments tailored to the user's workflow.

Quick data sorting

Automatic data input

 

 

The software automatically adds values to your experiment plan matrix to minimize the chance of input errors. In just a couple of clicks, you can export your data to an Excel spreadsheet.

Automatic data input

Easy Experiment Condition Data Organization

Automatic file name generation

You can click on each cell in the experiment plan, and the software will automatically generate a file name that contains the evaluation conditions for easy record keeping. Each file contains the associated images and data.

material science experiment conditions

Fast Measurement Results

Tolerance judgment

The tolerance judgment function enables you to confirm pass/fail at a glance based on set tolerances. The tolerance can be verified by changing the threshold value based on the sample yield.

Heat map

 

The software’s color map helps you better understand that data you collect during your experiment. The colors and heat map percentages are easy to change. Intuitive chart layouts and heat maps enable fast data visualization so that you can spot issues earlier in the process.

 

Multidata Analysis

Comparative data analysis

 

 


You can analyze multiple acquired datasets side by side with their display scales and 3D display angles integrated. Image correction and analysis can be performed simultaneously. This is useful for analyzing the shape of multiple samples with different processing conditions or for defect analysis. Various images, profiles, and numerical results can be exported to Excel, making it easier to quickly arrange and evaluate your data.

failure analysis 3D imaging

 
 
 

Main unit

Model OLS5100-SAF OLS5100-SMF OLS5100-LAF OLS5100-EAF
Total magnification

54x–17,280x

Field of view

16 µm–5,120 µm

Measurement principle Optical system Reflection-type confocal laser scanning laser microscope
Reflection-type confocal laser scanning laser-DIC microscope
Color
Color-DIC
  Light receiving element Laser: Photomultiplier (2 channels)
Color: CMOS color camera
Height measurement Display resolution 0.5 nm
  Dynamic range 16 bits
  Repeatability σn-1*1 *2 *5 5X:0.45 μm, 10X:0.1 μm, 20X : 0.03 μm, 50X : 0.012 μm, 100X : 0.012 μm
  Accuracy *1 *3 *5 0.15+L/100 μm (L:Measuring length[μm])
  Accuracy for stitched image *1 *3 *5 10X:5.0+L/100 μm, 20X or higher : 1.0+L/100 μm (L: Stitching length [μm])
  Measurement noise (Sq noise) *1 *4 *5 1 nm (Type)
Width measurement Display resolution 1 nm
  Repeatability 3σn-1  *1 *2 *5 

5X: 0.45 µm, 10X: 0.1 µm, 20X: 0.03 µm, 50X: 0.012 µm, 100X: 0.012 µm

  Accuracy *1 *3 *5 Measurement value +/- 1.5%
  Accuracy for stitched image *1 *3 *5 10X : 24+0.5L μm, 20X : 15+0.5L μm, 50X : 9+0.5L μm, 100X : 7+0.5L μm (L: Stitching length [mm])
Maximum number of measuring points in a single measurement

4096 × 4096 pixels

Maximum number of measuring points

36-megapixels

XY stage configuration Length measurement module NA NA
  Operating range

100 × 100 mm (3.9 × 3.9 in.) Motorized

100 × 100 mm (3.9 × 3.9 in.) Manual

300 × 300 mm (11.8 × 11.8 in.) Motorized

100 × 100 mm (3.9 × 3.9 in.) Motorized

Maximum sample height

100 × 100 mm (3.9 × 3.9 in.)

30 mm (1.2 in.)

30 mm (1.2 in.)

210 mm (8.3 in.)

Laser light source Wavelength 405 nm
  Maximum output 0.95 mW
  Laser class Class 2 (IEC60825-1:2007, IEC60825-1:2014)
Color light source White LED
Electrical power 240 W 240 W 278 W 240 W
Mass Microscope body Approx. 31 kg (68.3 lb) Approx. 32 kg (70.5 lb) Approx. 50 kg (110.2 lb) Approx. 43 kg (94.8 lb)
  Control box Approx. 12 kg (26.5 lb)

*1 Guaranteed when used in constant temperature and constant-temperature environment (temperature: 20˚C±1˚C, humidity: 50%±10%) specified in ISO554(1976), JIS Z-8703(1983).
*2 For 20x or higher, when measured with MPLAPON LEXT series objectives.
*3 When measured with dedicated LEXT objective.
*4 Typical value when measured with MPLAPON100XLEXT objective, and may differ from the guaranteed value.
*5 Guaranteed under Olympus Certificate System.

** The OS license of Window 10 has been certified for the microscope controller provided by olympus. Therefore, Microsoft's license terms are applied and you agree to the terms.Please refer to the following for Microsoft license terms.
https://www.microsoft.com/en-us/Useterms/Retail/Windows/10/UseTerms_Retail_Windows_10_english.htm

 


Objectives

Series Model Numerical Aperture (NA) Working Distance (WD) (mm)
UIS2 objective lens MPLFLN2.5x 0.08 10.7
MPLFLN5x 0.15 20
Dedicated LEXT objective lens (10X) MPLFLN10xLEXT 0.3 10.4
Dedicated LEXT objective lens (high-performance type) MPLAPON20xLEXT 0.6 1
MPLAPON50xLEXT 0.95 0.35
MPLAPON100xLEXT 0.95 0.35
Dedicated LEXT objective lens (l
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